Step & flash imprint lithography

被引：108

作者：

Resnick, Douglas J. ^{[1
]}

Sreenivasan, S. V. ^{[2
]}

Willson, C. Grant ^{[3
]}

机构：

[1] Motorola Labs, Tempe, AZ 85284 USA

[2] Mol Imprints Inc, Austin, TX 78758 USA

[3] Univ Texas Austin, Dept Chem Engn, Austin, TX 78712 USA

来源：

MATERIALS TODAY | 2005年 / 8卷 / 02期

关键词：

D O I：

10.1016/S1369-7021(05)00700-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The escalating cost of next generation lithography (NGL) is driven in part by the need for complex sources and optics. The cost for a single NGL tool could soon exceed $50 million, a prohibitive amount for many companies. As a result, several research groups are looking at alternative, low-cost methods for printing sub-100 nm features. Many of these methods are limited in their ability to do precise overlay. In 1999, Willson and Sreenivasan developed step and flash imprint lithography (S-FIL (TM)). The use of a quartz template opens up the potential for optical alignment of the wafer and template. This paper reviews several key aspects of the S-FIL process, including template, tool, ultraviolet (UV)-curable monomer, and pattern transfer. Two applications are also presented: contact holes and surface acoustic wave (SAW) filters.

引用

页码：34 / 42

页数：9

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