Structural analysis of hydrogenated carbon films obtained by reactive direct current magnetron sputtering

被引：7

作者：

Fujimaki, S ^{[1
]}

Matsumoto, H ^{[1
]}

Kokaku, Y ^{[1
]}

Kitoh, M ^{[1
]}

Tsumita, N ^{[1
]}

机构：

[1] HITACHI LTD, DATA STORAGE & RETRIEVAL SYST DIV, ODAWARA, KANAGAWA 256, JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1996年 / 14卷 / 01期

关键词：

D O I：

10.1116/1.579917

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Amorphous hydrogenated carbon films were prepared by reactive direct current magnetron sputtering in argon plasma containing methane as the reactant gas. The films were characterized using various spectroscopic measurements such as Raman scattering, optical absorption spectroscopy in the ultraviolet-visible region, and infrared (IR) absorption spectroscopy. The spectral analyses indicated that changes in Raman spectroscopy intensity occurring with increasing methane gas content were determined to be caused by changes in optically resonant components in the films. Furthermore, a significant correlation was seen between the relative intensity of IR peaks and wear durability. (C) 1996 American Vacuum Society.

引用

页码：194 / 196

页数：3

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