Anodization of Ti Thin Film Deposited on ITO

被引：84

作者：

Sadek, Abu Z. ^{[1
]}

Zheng, Haidong ^{[1
]}

Latham, Kay ^{[2
]}

Wlodarski, Wojtek ^{[1
]}

Kalantar-zadeh, Kourosh ^{[1
]}

机构：

[1] RMIT Univ, Sch Elect & Comp Engn, Melbourne, Vic, Australia

[2] RMIT Univ, Sch Appl Sci, Melbourne, Vic, Australia

来源：

LANGMUIR | 2009年 / 25卷 / 01期

关键词：

OXIDE NANOTUBE ARRAYS; TITANIA NANOTUBES; ANODIC-OXIDATION; MU-M; PHOTOCHROMIC BEHAVIOR; NANOSTRUCTURED TIO2; SOLAR-CELLS; TA6V ALLOY; ELECTROLYTES; FABRICATION;

D O I：

10.1021/la802456r

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We have investigated several key aspects for the self-organization of nanotubes in RF sputtered titanium (Ti) thin films formed by the anodization process in fluoride-ion-containing neutral electrolytes. Ti films were deposited on indium tin oxide (ITO) glass substrates at room temperature and 300 degrees C, and then anodized. The films were studied using scanning electron microscopy (SEM), X-ray diffraction (XRD), and UV-vis spectrometry before and after anodization. It was observed that anodization of high temperature deposited films resulted in nanotube type structures with diameters in the range of 10-45 nm for an applied voltage of 5-20 V. In addition, the anatase form of TiO(2) is formed during the anodization process which is also confirmed using photocurrent measurements. However, the anodization of room temperature deposited Ti films resulted in irregular pores or holes.

引用

页码：509 / 514

页数：6

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