Systematic study on photofabrication of surface relief grating on high-Tg azobenzene polymers

被引:25
作者
Fukuda, T
Matsuda, H
Viswanathan, NK
Tripathy, S
Kumar, J
Shiraga, T
Kato, M
Nakanishi, H
机构
[1] Natl Inst Mat & Chem Res, Dept Polymer Chem, Tsukuba, Ibaraki 3058565, Japan
[2] Univ Lowell, Ctr Adv Mat, Lowell, MA 01854 USA
[3] Sci Univ Tokyo, Dept Mat Sci & Technol, Noda, Chiba 2788510, Japan
[4] Tohoku Univ, Inst Chem React Sci, Aoba Ku, Sendai, Miyagi 9808577, Japan
关键词
amorphous thin films; spin casting; atomic force microscopy; other opto-electronic devices;
D O I
10.1016/S0379-6779(98)01262-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Photofabrication of surface relief grating (SRG) on maleimide-based high-Tg polymers with different degree of azobenzene functionalization were investigated. From the systematic study on these polymers, a number of new insights into the fabrication process and chain dynamics were established: I) the surface modulation of photofabricated SRG depends on the functionalization 2) the formation of SRG requires a minimum threshold intensity of exposing light. 3) this minimum threshold doesn't depend on the degree of functionalization of the polymer. 4) the temperature dependence of the SRG formation was not depend on the degree of functionalization. From these results, it is suggested that the photofabrication of SRG does not have any hearing on the bulk properties of the sample.
引用
收藏
页码:1435 / 1436
页数:2
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