Optical humidity sensitivity of plasma-oxidized nickel oxide films

被引：13

作者：

Ando, M ^{[1
]}

Sato, Y ^{[1
]}

Tamura, S ^{[1
]}

Kobayashi, T ^{[1
]}

机构：

[1] Osaka Natl Res Inst, AIST, MITI, Ikeda, Osaka 5638577, Japan

来源：

SOLID STATE IONICS | 1999年 / 121卷 / 1-4期

关键词：

optical humidity sensors; nickel oxide; plasma oxidation; Co-evaporation; visible absorbance change;

D O I：

10.1016/S0167-2738(99)00054-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We report on the optical humidity sensitivity of nickel oxide (NiO) films prepared by plasma oxidation of nickel-carbon composite films. The plasma-oxidized NiO films showed humidity-sensitive absorbance change at room temperature. The optical absorbance change was strongest at wavelengths around 560 nm. The reversible absorbance change over a wide humidity range of 0-90% RH and the response time within several minutes were obtained with the plasma-oxidized NiO films which is a potential candidate for optical humidity detection. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：307 / 311

页数：5

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