Local transport property on ferromagnetic tunnel junction measured using conducting atomic force microscope

被引：20

作者：

Ando, Y ^{[1
]}

Kameda, H ^{[1
]}

Kubota, H ^{[1
]}

Miyazaki, T ^{[1
]}

机构：

[1] Tohoku Univ, Grad Sch Engn, Dept Appl Phys, Sendai, Miyagi 9808579, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1999年 / 38卷 / 7A期

关键词：

ferromagnetic tunnel junction; TMR; AFM; topographical image; electrical image; local transport;

D O I：

10.1143/JJAP.38.L737

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The local topographical and electrical properties were measured simultaneously for a Ni80Fe20/Co/Al-oxide junction. Images with a lateral resolution of I nm and a current sensitivity of 3 pA were successfully obtained no strong correlation between them was observed. From the results of local current-voltage characteristics also measured, it was clarified that the contrast of the current image indicated the distribution of barrier heights. The histogram of current density calculated by taking into consideration a Gaussian distribution corresponded qualitatively to the experimental result.

引用

页码：L737 / L739

页数：3

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