Positronium annihilation in mesoporous thin films

被引:278
作者
Gidley, DW [1 ]
Frieze, WE
Dull, TL
Yee, AF
Ryan, ET
Ho, HM
机构
[1] Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA
[2] Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA
[3] SEMATECH, Austin, TX 78741 USA
来源
PHYSICAL REVIEW B | 1999年 / 60卷 / 08期
关键词
D O I
10.1103/PhysRevB.60.R5157
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Depth-profiled positronium lifetime spectroscopy is used to probe the pore characteristics (size, distribution, and interconnectivity) in porous, low-dielectric silica films. The technique is sensitive to the entire void volume, both interconnected and isolated, even if the film is buried beneath a metal or oxide layer. Our extension of a simple quantum mechanical model of Ps annihilation in a pore adequately accounts for the temperature and pore size dependence of the Ps lifetime for pore sizes in the range from 0.1 nm to 600 nm. It is applicable to any porous media. [S0163-1829(99)51932-2].
引用
收藏
页码:R5157 / R5160
页数:4
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