Electronic sputtering of thin conductors by neutralization of slow highly charged ions

被引：55

作者：

Schenkel, T ^{[1
]}

Briere, MA ^{[1
]}

SchmidtBocking, H ^{[1
]}

Bethge, K ^{[1
]}

Schneider, DH ^{[1
]}

机构：

[1] UNIV FRANKFURT, INST KERNPHYS, D-6000 FRANKFURT, GERMANY

来源：

PHYSICAL REVIEW LETTERS | 1997年 / 78卷 / 12期

关键词：

D O I：

10.1103/PhysRevLett.78.2481

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Charge states of slow (upsilon approximate to 0.3 upsilon(Bohr)) highly charged ions (O7+, Ar-16,Ar-18+, Kr33+, Th65+) have been determined after transmission through 10 nm thick amorphous carbon foils. Up to the highest charge states, ions reach charge state equilibrium in the foils within less than 21 fs. High yields of secondary ions are emitted from the foils as a result of the dissipation of tens to hundreds of keV of potential energy during ion neutralization. Positive secondary carbon ion yields increase strongly for q > 25+. Our results demonstrate, for the first time, the occurrence of electronic sputtering in the interaction of slow ions with thin conductors.

引用

页码：2481 / 2484

页数：4

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