Analytic form for the power spectral density in one, two, and three dimensions

被引:32
作者
Mack, Chris A. [1 ]
机构
[1] Lithoguru Com, Austin, TX 78703 USA
来源
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 2011年 / 10卷 / 04期
关键词
power spectral density; autocorrelation function; stochastic modeling; line-edge roughness; linewidth roughness; LINE-EDGE ROUGHNESS;
D O I
10.1117/1.3663567
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Analytical expressions for the power spectral density (PSD) are often useful in stochastic lithography simulation and the metrology of roughness. Using a common stretched exponential correlation function with three parameters (standard deviation, correlation length, and roughness exponent), the PSD can be computed as the Fourier transform of the autocorrelation function. For the special cases of roughness exponent equal to 0.5 and 1, the PSD can be computed analytically for one, two, and three dimensions. In this paper, the analytical results of these calculations are given. The resulting equations can be used when modeling rough lines, surfaces, or volumes. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI:10.1117/1.3663567]
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页数:2
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