Correlation between topographic and magnetic properties of electrochemically prepared nickel films

被引：8

作者：

Bubendorff, JL ^{[1
]}

Pflaum, J ^{[1
]}

Huebner, E ^{[1
]}

Raiser, D ^{[1
]}

Bucher, JP ^{[1
]}

Pelzl, J ^{[1
]}

机构：

[1] RUHR UNIV BOCHUM,INST EXPT PHYS 3,D-44780 BOCHUM,GERMANY

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1997年 / 165卷 / 1-3期

关键词：

thin films - electrodeposited; thin films - topography; ferromagnetic resonance; atomic force microscopy;

D O I：

10.1016/S0304-8853(96)00506-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The correlation between the structural and the magnetic properties are investigated on electrodeposited Ni films on (111) textured gold buffer layers on mica and glass substrates. The topological characteristics of the film surface are analyzed by atomic force microscopy (AFM) and the corresponding magnetic behavior is studied by ferromagnetic resonance (FMR). The FMR linewidth is found to depend strongly on the thickness of the Ni film samples and on the topography of the underlying gold film. Confrontation with AFM results indicate a loss in the lateral coherence length for the thinner Ni films.

引用

页码：199 / 201

页数：3

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