First-principles study of Ag adatoms on the Si(111)-√3 x √3-Ag surface

被引:67
作者
Aizawa, H [1 ]
Tsukada, M [1 ]
机构
[1] Univ Tokyo, Grad Sch Sci, Dept Phys, Bunkyo Ku, Tokyo 1130033, Japan
关键词
D O I
10.1103/PhysRevB.59.10923
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have performed first-principles calculations for a model system with the root 3x root 3 periodicity in which a Ag adatom per unit cell is adsorbed upon the Si(111)-root 3x root 3-Ag surface, whereby discussing the atomic and electronic structures of the Si(111)-root 21x root 21-(Ag+Ag) and -(Ag+Au) surfaces. It has been found that the adatom prefers to be located upon Ag triangles rather than upon Si trimers of the underlying surface. The band structure calculated for the most favorable atomic arrangement exhibits the two surface states characteristic for the root 21x root 21 surfaces. By performing population analyses for these states it is shown that the lower state stems from the so-called Si surface state of the underlying surface, while the upper state is an adatom-induced state, at variance with previous assignments. The electronic structure of the Si(111)-root 3x root 3-Ag surface is also discussed, and a picture concerning the so-called SI surface state is presented. [S0163-1829(99)00216-7].
引用
收藏
页码:10923 / 10927
页数:5
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