Effect of aluminum co-doping on fluorescence properties of Sm2+-doped SiO2 films prepared by rf magnetron sputtering method

被引:2
作者
Ishihara, T [1 ]
Tanaka, K [1 ]
Hirao, K [1 ]
Soga, N [1 ]
机构
[1] KYOTO UNIV,FAC ENGN,DIV MAT CHEM,SAKYOU KU,KYOTO 60601,JAPAN
关键词
D O I
10.1246/nikkashi.1997.430
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Thin films of aluminum co-doped SiO2: Sm2+ were prepared by rf magnetron sputtering method. Effects of Al dopant on fluorescence spectra and local structure of Sm2+ ions were studied. The peak intensity due to the D-5(0)-F-7(0) transition of Sm2+ ions increases by more than one order of magnitude with an addition of Al dopant. For specimens with low concentration of Sm2+, the peak intensity increases with an increase in the Sm2+ concentration. The rate of the increase in peak intensity with Sm2+ concentration depends on the kind of co-sputtered Al compounds. The width of the peak becomes narrow, and the position of the peak shifts to a shorter wavelength with an addition of Al dopant. It is thought that the addition of Al dopant prevents the clustering of Sm2+ ions and leads to the homogeneous dispersion of Sm2+ ions in the SiO2 glass matrix.
引用
收藏
页码:430 / 434
页数:5
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