Photodegradation of polycarbonate under narrow band irradiation at 172 nm

被引:30
作者
Geretovszky, Z
Hopp, B
Bertóti, I
Boyd, IW
机构
[1] Univ Szeged, Dept Opt & Quantum Elect, H-6701 Szeged, Hungary
[2] Hungarian Acad Sci, Res Grp Laser Phys, H-6701 Szeged, Hungary
[3] Hungarian Acad Sci, Chem Res Ctr, Res Lab Mat & Environm Chem, H-1525 Budapest, Hungary
[4] UCL, Dept Elect & Elect Engn, London WC1E 7JE, England
关键词
vacuum ultraviolet; photodegradation; polycarbonate; excimer lamp;
D O I
10.1016/S0169-4332(01)00615-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Photostability of polymers is an important issue since most polymers tend to loose their original properties upon exposure to light, especially to ultraviolet radiation. Polycarbonates are widely used industrial materials because of their excellent properties, which includes transparency, high tensile strength, impact resistance and rigidity. In this paper, we present results on 172 nm photodegradation of polycarbonate (PC) films. PC films of 50 mum thickness were irradiated for up to 20 min using a Xe-2* excimer lamp system. Ex situ UV visible spectroscopic investigation of the treated films revealed the appearance of two strong absorption bands at 279 and 317 nm and a third broad band centred around 380 nm whose intensity increased linearly with illumination time. The morphological changes were characterised by atomic force microscopy and resulted in a gradually increasing roughness, being a linear function of irradiation time. The interpretation of the observed chemical degradation is based on attenuated total reflection IR and X-ray photoelectron spectroscopic measurements which show cleavage of the aromatic C-C and carboxylic CO-O bonds together with some nitrogen incorporation into the surface layer of the irradiated films. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:85 / 90
页数:6
相关论文
共 9 条
[1]  
Factor A, 1996, ADV CHEM SER, V249, P59
[2]   High-intensity sources of incoherent UV and VUV excimer radiation for low-temperature materials processing [J].
Kogelschatz, U ;
Esrom, H ;
Zhang, JY ;
Boyd, IW .
APPLIED SURFACE SCIENCE, 2000, 168 (1-4) :29-36
[3]   PHOTOCHEMISTRY AND PHOTODEGRADATION OF POLYCARBONATE [J].
PANKASEM, S ;
KUCZYNSKI, J ;
THOMAS, JK .
MACROMOLECULES, 1994, 27 (14) :3773-3781
[4]  
Rivaton A, 1998, ANGEW MAKROMOL CHEM, V262, P173
[5]   THE PHOTOCHEMISTRY OF BISPHENOL-A POLYCARBONATE RECONSIDERED [J].
RIVATON, A ;
SALLET, D ;
LEMAIRE, J .
POLYMER PHOTOCHEMISTRY, 1983, 3 (06) :463-481
[6]   RECENT ADVANCES IN BISPHENOL-A POLYCARBONATE PHOTODEGRADATION [J].
RIVATON, A .
POLYMER DEGRADATION AND STABILITY, 1995, 49 (01) :163-179
[7]   IDENTIFICATION OF FLUORESCENT PRODUCTS PRODUCED BY THE THERMAL-TREATMENT OF BISPHENOL-A-BASED POLYCARBONATE [J].
RUFUS, IB ;
SHAH, H ;
HOYLE, CE .
JOURNAL OF APPLIED POLYMER SCIENCE, 1994, 51 (09) :1549-1558
[8]  
Silverstein R.M., 1991, SPECTROSCOPIC IDENTI
[9]   Efficient excimer ultraviolet sources from a dielectric barrier discharge in rare-gas/halogen mixtures [J].
Zhang, JY ;
Boyd, IW .
JOURNAL OF APPLIED PHYSICS, 1996, 80 (02) :633-638