The effect of RF power on the electrochromic response time of sputter-deposited Ni oxide films

The effect of RF power on (he electrochromic properties and response time of Ni oxide films grown by RF magnetron sputtering were investigated by in situ transmittance measurements with continuous potential cycling and a pulse potential cycling test. Although the coloration efficiency and crystallographic structure were independent of RF power, transmittance difference, transient cycling period. charge density. and response time during coloring/bleaching process were significantly affected. This can be attributed to the presence of electrochromic inactive components. produced as the result of the fast growth rate, high RF power, and low film density.