The fabrication of filter-less fluorescence detection sensor array using CMOS image sensor technique

被引:20
作者
Maruyama, Y
Sawada, K
Takao, H
Ishida, M
机构
[1] Toyohashi Univ Technol, Dept Elect & Elect Engn, Toyohashi, Japan
[2] Toyohashi Univ Technol, Intelligent Sensing Syst Res Ctr, Toyohashi, Aichi 4418580, Japan
关键词
fluorescence; filter-less; CMOS image sensor;
D O I
10.1016/j.sna.2006.01.017
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 [电气工程]; 0809 [电子科学与技术];
摘要
A novel sensor array, which is filter-less fluorescence detection sensor, was successfully fabricated using CMOS 5 mu m silicon integrated circuit technology. Previously filter-less fluorescence detection sensors were proposed and fabricated, and they were able to sense fluorescence intensity. CMOS image sensor technique was applied for the filter-less fluorescence detection sensor, and it was able to operate a charge accumulation mode. Consequently, it was confirmed that general CMOS image sensor technique can be applied to the novel filter-less fluorescence detection sensor. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:66 / 70
页数:5
相关论文
共 4 条
[1]
MARUYAMA Y, 2004, MICRO TOTAL ANAL SYS, V2, P491
[2]
MCKELVEY JP, 1966, SOLID STATE SEMICOND, P463
[3]
Multipoint parallel excitation and CCD-based imaging system for high-throughput fluorescence detection of biochip micro-arrays [J].
Mehta, DS ;
Lee, CY ;
Chiou, A .
OPTICS COMMUNICATIONS, 2001, 190 (1-6) :59-68
[4]
Mendis S. K., 1993, International Electron Devices Meeting 1993. Technical Digest (Cat. No.93CH3361-3), P583, DOI 10.1109/IEDM.1993.347235