Microstructure and exchange coupling parameters of MTJ with CoFeB bottom electrode

被引:9
作者
Kanak, J
Stobiecki, T
Schebaum, O
Reiss, G
Brückl, H
机构
[1] AGH Univ Sci & Technol, Dept Elect, PL-30059 Krakow, Poland
[2] AGH Univ Sci & Technol, Fac Phys & Appl Comp Sci, PL-30059 Krakow, Poland
[3] Univ Bielefeld, Nano Devices Grp, D-33501 Bielefeld, Germany
[4] ARCS, A-1220 Vienna, Austria
来源
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS | 2006年 / 243卷 / 01期
关键词
D O I
10.1002/pssb.200562456
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
In this study, we report the relationship between interface roughness, texture and the exchange bias and the interlayer-Neel coupling fields of the spin-valve magnetic tunnel junction (SV-MTJ). SV-MTJs with the structure: Si(100)/SiO2/buffer/IrMn/CoFeB/AlOx/NiFe/Ta were deposited on two buffers: Cu and Ta/Cu/Ta/Cu, and next the samples were annealed in vacuum and in a magnetic field. XRD analysis reveals that the texture degree of MTJ with Cu buffer is significantly lower than that of the sample with Ta/Cu/Ta/Cu buffer. The enhancement of IrMn and CoFeB texture leads to a higher amplitude of roughness and an increase of exchange bias and Neel coupling fields. The comparison of junctions with CoFe and CoFeB bottom electrodes shows that addition of 5% B in a CoFe layer makes the surface of the pinned layer smoother. This leads to a lower Neel coupling field, which is desirable for application of MTJ in MRAM technology. (c) 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:197 / 201
页数:5
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