Dynamics of dopant product formation in the nanosecond irradiation of doped PMMA at 248 and 193 nm: Temporal evolution of temperature and viscosity

被引:10
作者
Bounos, G [1 ]
Athanassiou, A [1 ]
Anglos, D [1 ]
Georgiou, S [1 ]
机构
[1] Fdn Res & Technol Hellas, Inst Elect Struct & Laser, Iraklion 71110, Crete, Greece
关键词
D O I
10.1016/j.cplett.2005.10.133
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The kinetics of the dopant-deriving products formed upon photolysis of the photolabile iodonaphthalene and iodophenanthrene dispersed within PMMA films is examined at 248 and 193 nm. The products include ArH, formed via a thermally activated process, and NaP2, formed via diffusion-limited reaction. Therefore. their formation kinetics affords a direct probe of the temporal evolution of the temperature and of the viscosity of the polymer upon UV irradiation. It is demonstrated that at both wavelengths, kinetics is well accounted by a thermal mechanism. However, the viscosity changes deviate much from conventional measurements. In addition, the results illustrate the importance of the interplay of temperature evolution and of the induced transient polymer melting on product formation. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:317 / 322
页数:6
相关论文
共 27 条
[1]  
[Anonymous], 1987, MECH PHOTOPHYSICAL P
[2]   LASER ABLATION OF DOPED POLYMERS - TRANSIENT PHENOMENA AS THE ABLATION THRESHOLD IS APPROACHED [J].
ARNOLD, BR ;
SCAIANO, JC .
MACROMOLECULES, 1992, 25 (05) :1582-1587
[3]   Model for laser-induced thermal degradation and ablation of polymers [J].
Arnold, N ;
Bityurin, N .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 68 (06) :615-625
[4]   Pulsed laser ablation and deposition of thin films [J].
Ashfold, MNR ;
Claeyssens, F ;
Fuge, GM ;
Henley, SJ .
CHEMICAL SOCIETY REVIEWS, 2004, 33 (01) :23-31
[5]  
BAUERLE D, 2000, LASER PROCESSING CHE, pCH12
[6]   Models for laser ablation of polymers [J].
Bityurin, N ;
Luk'yanchuk, BS ;
Hong, MH ;
Chong, TC .
CHEMICAL REVIEWS, 2003, 103 (02) :519-552
[7]   UV laser modifications and etching of polymer films (PMMA) below the ablation threshold [J].
Bityurin, N ;
Muraviov, S ;
Alexandrov, A ;
Malyshev, A .
APPLIED SURFACE SCIENCE, 1997, 109 :270-274
[8]  
Bounos G, 2004, J PHYS CHEM B, V108, P7050
[9]  
BOUNOS G, IN PRESS J APPL PHYS
[10]   TEMPERATURE-MEASUREMENTS OF POLYIMIDE DURING KRF EXCIMER LASER ABLATION [J].
BRUNCO, DP ;
THOMPSON, MO ;
OTIS, CE ;
GOODWIN, PM .
JOURNAL OF APPLIED PHYSICS, 1992, 72 (09) :4344-4350