Enhancement of photochemical deposition (PCD) and analysis of surface spread of US crystalline thin films

被引：17

作者：

Padmavathy, R

Rajesh, NP

Arulchakkaravarthi, A

Gopalakrishnan, R ^{[1
]}

Santhanaraghavan, P

Ramasamy, P

机构：

[1] Anna Univ, Dept Phys, Chennai 600025, India

[2] Anna Univ, Ctr Crystal Growth, Chennai 600025, India

来源：

MATERIALS LETTERS | 2002年 / 53卷 / 4-5期

关键词：

photochemical deposition; induction period; ethelenediaminetetraacetic acid (EDTA); CdS; surface morphology; microscopic studies;

D O I：

10.1016/S0167-577X(01)00500-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The enhancement of the photochemical deposition (PCD) of polycrystalline thin films of US with the addition of EDTA has been established. The effect of concentration of EDTA on the surface coverage of the film has been studied using optical microscope. (C) 2002 Published by Elsevier Science B.V.

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收藏

页码：321 / 325

页数：5

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