Effect of different dopant elements on the properties of ZnO thin films

被引:364
作者
Nunes, P [1 ]
Fortunato, E
Tonello, P
Fernandes, FB
Vilarinho, P
Martins, R
机构
[1] Univ Nova Lisboa, Dept Mat Sci, Fac Sci & Technol, CEMOP,CENIMAT, P-2829516 Caparica, Portugal
[2] Univ Aveiro, Ceram & Glass Dept, P-3810193 Aveiro, Portugal
关键词
zinc oxide; spray pyrolysis; doping; TCO; thin films;
D O I
10.1016/S0042-207X(01)00322-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work we studied the influence of the dopant elements and concentration on the properties of ZnO thin film deposited by spray pyrolysis. The results show that the doping affects the thin films properties mainly the electrical ones, function of dopant concentration and nature. The most important changes were observed for films doped with 1 at% of indium which exhibit a resistivity of 1.9 x 10(-1) Omega cm associated with a transmitance of 90%. After the annealing treatment, the resistivity of the film decreases to 5.9 x 10(-3) Omega cm without significative changes in the optical properties. The films were also used to produce amorphous silicon solar cells where the best results were obtained for ZnO:In. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:281 / 285
页数:5
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