Generation and Self-Replication of Monolithic, Dual-Scale Polymer Structures by Two-Step Capillary-Force Lithography

被引:66
作者
Jeong, Hoon Eui
Kwak, Rhokyun
Kim, Jae Kwan
Suh, Kahp Y. [1 ]
机构
[1] Seoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South Korea
关键词
capillary-force lithography; dual-structure surfaces; microstructures; nanostructures;
D O I
10.1002/smll.200800151
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A two-step UV-assisted capillary molding technique for fabricating monolithic micro-nanoscale polymer structures over a large area was reported. A polydimethylsiloxane (PDMS) mold with micropatterns was placed onto spin-coated, UV-curable PUA resin on a flexible PET substrate. The polyurethane acrylate (PUA) resin was partially cured by UV exposure for 5-21. The PUA mold with nanopatterns was placed on the preformed microstructures under a slight pressure followed by additional UV exposure, after fabricating a partially cured microstructure. ATR-FTIR spectra were recorded in the mid-infrared range, from 400-600 cm-1 range. The advancing and decreasing contact angles of water droplet were measured by increasing and decreasing the volume of the drop with a contact angle analyzer. It was found that the micro-nanosclae combined hierarchical structure increases the CA of a water droplet, while reducing the CAH.
引用
收藏
页码:1913 / 1918
页数:6
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