Evolution of the mound morphology in (111) oriented polycrystalline Pd films and Co Pd multilayered films with Pd underlayers

被引:5
作者
Chung, IB [1 ]
Koo, YM
Kang, JS
Hong, JH
Jeong, JI
机构
[1] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, Pohang 790784, South Korea
[2] Catholic Univ Korea, Dept Phys, Puchon 422743, South Korea
[3] Res Inst Ind Sci & Technol, Pohang 790600, South Korea
关键词
D O I
10.1063/1.370729
中图分类号
O59 [应用物理学];
学科分类号
摘要
Pd thin films and Co/Pd multilayered films with progressively thicker Pd underlayers are prepared by physical vapor depositions. Their growth behaviors are investigated using atomic force microscopy and transmission electron microscopy. We observed that a mound occurs on top of each crystallite of (111) oriented polycrystalline Pd films and that the average mound size increases according to the capillary-induced coalescence mechanism. We attribute this observed growth instability to the step barrier which resists step-down diffusion of deposited atoms. We also observed that the mound slopes of Co/Pd multilayers are smaller than those of their Pd underlayers. We suggest that this results from a downhill current driven by the interface energy between the Co and Pd layers. (C) 1999 American Institute of Physics. [S0021-8979(99)04712-X].
引用
收藏
页码:306 / 310
页数:5
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