Characterization of electrochemically deposited Cu-Ni black coatings

被引：38

作者：

Aravinda, CL

Bera, P

Jayaram, V

Sharma, AK

Mayanna, SM ^{[1
]}

机构：

[1] Bangalore Univ, Cent Coll, Dept Chem, Bangalore 560001, Karnataka, India

[2] Indian Inst Sci, Solid State & Struct Chem Unit, Bangalore 560012, Karnataka, India

[3] Indian Space Res Org, Thermal Proc Sect, Satellite Ctr, Bangalore 560017, Karnataka, India

来源：

MATERIALS RESEARCH BULLETIN | 2002年 / 37卷 / 03期

关键词：

alloys; thin films; photoelectron spectroscopy; optical properties; microstructure;

D O I：

10.1016/S0025-5408(01)00821-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Electrochemically deposited Cu-Ni black coatings on molybdenum substrate from ethylenediaminetetraacetic acid (EDTA) bath solution are shown to exhibit good optical properties (alpha = 0.94, epsilon = 0.09). The deposit is characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). Cu is present in metallic and +2 oxidation states in the as-prepared Cu-Ni black coating, whereas Ni2+ as well as Ni3+ species are observed in the same coating. Cu and Ni are observed in their metallic state after 10 and 20 min sputtering. X-ray initiated Auger electron spectroscopy (XAES) of Cu and Ni also agrees well with XPS investigations. (C) 2002 Elsevier Science Ltd. All rights reserved.

引用

页码：397 / 405

页数：9

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