Photoresist characterization and linearization procedure for the gray-scale fabrication of diffractive optical elements

被引：38

作者：

LeCompte, M ^{[1
]}

Gao, X ^{[1
]}

Prather, DW ^{[1
]}

机构：

[1] Univ Delaware, Dept Elect Engn, Newark, DE 19716 USA

来源：

APPLIED OPTICS | 2001年 / 40卷 / 32期

关键词：

D O I：

10.1364/AO.40.005921

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present a procedure for the characterization and the linearization of the photoresist response to UV exposure for application to the gray-scale fabrication of diffractive optical elements. A simple and reliable model is presented as part of the characterization procedure. Application to the fabrication of surface-relief diffractive optical elements is presented, and theoretical predictions are shown to agree well with experiments. (C) 2001 Optical Society of America.

引用

页码：5921 / 5927

页数：7

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