Effect of the variation of film thickness on the structural and optical properties of ZnO thin films deposited on sapphire substrate using PLD

被引：129

作者：

Shim, ES ^{[1
]}

Kang, HS ^{[1
]}

Kang, JS ^{[1
]}

Kim, JH ^{[1
]}

Lee, SY ^{[1
]}

机构：

[1] Yonsei Univ, Dept Elect & Elect Engn, Seodaemoon Ku, Seoul 120749, South Korea

来源：

APPLIED SURFACE SCIENCE | 2002年 / 186卷 / 1-4期

关键词：

ZnO; pulsed-laser deposition; X-ray diffraction; photoluminescence;

D O I：

10.1016/S0169-4332(01)00746-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

ZnO thin films were deposited on sapphire (0 0 0 1) substrates with various thicknesses using a pulsed-laser deposition (PLD) technique in order to investigate the structural and optical properties of the films. The deposition conditions were optimized for UV emission property. The structural and optical properties were characterized with XRD and photoluminescence (PL). The increase in ZnO film thickness results in the improvement of the structural and optical properties. This enhancement could be due to the decrease of strain at the interface between ZnO film and sapphire substrate by the increase of film thickness. (C) 20021 Elsevier Science B.V. All rights reserved.

引用

页码：474 / 476

页数：3

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