Design and fabrication using nanoimprint lithography of a nanofluidic device for DNA stretching applications

被引：23

作者：

Abad, E. ^{[1
]}

Merino, S. ^{[1
]}

Retolaza, A. ^{[1
]}

Juarros, A. ^{[1
]}

机构：

[1] Fdn Tekniker, Eibar, Guipuzcoa, Spain

来源：

MICROELECTRONIC ENGINEERING | 2008年 / 85卷 / 5-6期

关键词：

nanoimprint lithography; nanochannels; DNA stretching;

D O I：

10.1016/j.mee.2007.12.048

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 [电气工程]; 0809 [电子科学与技术];

摘要：

In this work, we present the design and fabrication of a sealed micro/nanofluidic chip for DNA stretching applications, based on the use of the high-throughput nanoimprint lithography (NIL) technology combined with a conventional anodic bonding of the silicon base and Pyrex cover. Using the developed fabrication process sub-100 nm width nanochannels have been obtained. The complete chip, including microchannels for fluid transport and nanochannels for DNA stretching and visualization has been fabricated and packaged to facilitate the contact with the macroscopic world. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：818 / 821

页数：4

共 7 条

[1]

Fabrication of 10 nm enclosed nanofluidic channels [J].