X-ray photoelectron diffraction study of ultrathin PbTiO3 films

被引：13

作者：

Despont, L

Lichtensteiger, C

Clerc, F

Garnier, MG

de Abajo, FJG

Van Hove, MA

Triscone, JM

Aebi, P

机构：

[1] Univ Neuchatel, Inst Phys, CH-2000 Neuchatel, Switzerland

[2] Univ Geneva, DPMC, CH-1211 Geneva, Switzerland

[3] Univ Basque Country, EHU, CSIC, Ctr Mixto, E-20080 San Sebastian, Spain

[4] City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China

来源：

EUROPEAN PHYSICAL JOURNAL B | 2006年 / 49卷 / 02期

关键词：

D O I：

10.1140/epjb/e2006-00050-0

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Full hemispherical X-ray photoelectron diffraction (XPD) experiments have been performed to investigate at the atomic level ultrathin epitaxial c-axis oriented PbTiO3 (PTO) films grown on Nb-doped SrTiO3 substrates. Comparison between experiment and theory allows us to identify a preferential ferroelectric polarization state in a 60 angstrom - thick PTO film. Multiple scattering theory based on a cluster-model [Phys. Rev. B 63, 075404 ( 2001)] is used to simulate the experiments.

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收藏

页码：141 / 146

页数：6

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