TEM observation of crack- and pit-shaped defects in electrically degraded GaNHEMTs

被引:134
作者
Chowdhury, Uttiya [1 ]
Jimenez, Jose L. [1 ]
Lee, Cathy [1 ]
Beam, Edward [1 ]
Saunier, Paul [1 ]
Balistreri, Tony [1 ]
Park, Seong-Yong [2 ]
Lee, Taehun [2 ]
Wang, J. [2 ]
Kim, Moon J. [2 ]
Joh, Jungwoo [3 ]
del Alamo, Jesus A. [3 ]
机构
[1] TriQuint Semicond, Richardson, TX 75025 USA
[2] Univ Texas Dallas, Richardson, TX 75083 USA
[3] MIT, Cambridge, MA 02139 USA
关键词
electron microscopy; gallium compounds; life estimation; microwave FETs; semiconductor heterojunctions;
D O I
10.1109/LED.2008.2003073
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
AlGaN/GaN high-electron mobility transistors stressed under de bias at various channel temperatures were studied using transmission electron microscopy for evidence of physical damage. Stressed devices consistently developed crack- and pit-shaped defects in the AlGaN/GaN crystal material under the drain-side edge of the gate, whereas side-by-side as-processed unstressed devices did not show these features. Furthermore, the amount of physical damage was found to correlate to the amount of electrical degradation as measured by the change in ID a from before and after stress. The formation of these defects is consistent with the theory of damage from the inverse piezoelectric effect.
引用
收藏
页码:1098 / 1100
页数:3
相关论文
共 8 条
[1]   CONVERSE PIEZOELECTRIC EFFECT IN [111] STRAINED-LAYER HETEROSTRUCTURES [J].
BAHDER, TB .
PHYSICAL REVIEW B, 1995, 51 (16) :10892-10896
[2]  
FANNING D, 2007, P INT C CS MANT AUST
[3]  
JIMENEZ JL, 2006, P ROCS SAN ANT TX NO
[4]  
Joh J., 2006, IEDM, P415
[5]   Gate current degradation mechanisms of GaN high electron mobility transistors [J].
Joh, Jungwoo ;
Xia, Ling ;
del Alamo, Jesus A. .
2007 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, VOLS 1 AND 2, 2007, :385-388
[6]   In situ measurements of the critical thickness for strain relaxation in AlGaN/GaN heterostructures [J].
Lee, SR ;
Koleske, DD ;
Cross, KC ;
Floro, JA ;
Waldrip, KE ;
Wise, AT ;
Mahajan, S .
APPLIED PHYSICS LETTERS, 2004, 85 (25) :6164-6166
[7]  
SARUA A, 2006, APPL PHYS LETT, V88
[8]  
SAUNIER P, 2007, P IEEE DRC, P35