Microstructure of Ti-48.2 at. pct Ni shape memory thin films

被引：84

作者：

Ishida, A ^{[1
]}

Ogawa, K ^{[1
]}

Sato, M ^{[1
]}

Miyazaki, S ^{[1
]}

机构：

[1] UNIV TSUKUBA,INST MAT SCI,TSUKUBA,IBARAKI 305,JAPAN

来源：

METALLURGICAL AND MATERIALS TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE | 1997年 / 28卷 / 10期

关键词：

Material Transaction; TiNi; Lattice Image; Bulk Specimen; High Resolution Electron Microscope;

D O I：

10.1007/s11661-997-0155-x

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Amorphous thin films of Ti-48.2 at. pct Ni formed by puttering were annealed at 773 K for 5 minutes, 1 hour, and 10 hours. It was found by transmission electron microscopy (TEM) that the microstructure changes in the sequence of (1) Guinier-Preston (GP) zones for 5 minutes, (2) GP zones and Ti2Ni precipitates for 1 hour, and (3) Ti,Ni precipitates for 10 hours, A high-resolution electron microscope (HREM) revealed that Ti,Ni precipitates have partial coherency with the TiNi matrix.

引用

页码：1985 / 1991

页数：7

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