Atmospheric pressure discharge plasma decomposition for gaseous air contaminants - Trichlorotrifluoroethane and trichloroethylene

被引：38

作者：

Oda, T ^{[1
]}

Yamashita, R ^{[1
]}

Takahashi, T ^{[1
]}

Masuda, S ^{[1
]}

机构：

[1] FUKUI INST TECHNOL,FUKUI 910,JAPAN

来源：

IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS | 1996年 / 32卷 / 02期

关键词：

Chemical reactors - Electrodes - Fluorocarbons - Gas chromatography - Gas emissions - Impurities - Mass spectrometry - Plasmas - Reaction kinetics - Surface discharges;

D O I：

10.1109/28.491469

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The decomposition performance of gaseous environmental destructive contaminants in air by using atmospheric pressure discharge plasma including the surface discharge induced plasma chemical processing (SPCP) was examined. The main contaminants tested were chlorofluorocarbon (CFC-113) and trichloroethylene, typically. The discharge exciting frequency range studied was wide-50 Hz to 50 kHz, Results showed the low frequency discharge requires high voltage to inject high electric power in the gas and to decompose the contaminants. A Gas Chromatograph Mass Spectrometer was used to analyze discharge products of dense CFC-113 or trichloroethylene, Among the detected products were HCl, CClFO, and CHCl3. Two different electrode configurations; the silent discharge (coaxial) electrode and the coil-electrode were also tested and compared to each other as a gas reactor.

引用

页码：227 / 232

页数：6

共 8 条

[1] A CERAMIC-BASED OZONIZER USING HIGH-FREQUENCY DISCHARGE [J].

MASUDA, S ;

AKUTSU, K ;

KURODA, M ;

AWATSU, Y ;

SHIBUYA, Y .

IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, 1988, 24 (02) :223-231

[2]

MASUDA S, 1990, P 4 INT C EL PREC, P615

[3]

MASUDA S, 1991, REC 1991 IEEE IAS AN, P740

[4]

Oda T., 1991, 1991 P IEEE IND APPL, P734

[5]

ODA T, 1992, 1992 IEEE IAS ANN M, P1570

[6]

VONSIEMENS W, 1857, POGG ANN CHEM, V102, P12

[7]

WAKABAYASHI T, 1989, P 9 INT S PLASM CHEM, pL111

[8]

YAMAMOTO T, 1989, 1989 IEEE IAS ANN M, P2175

← 1 →