Microfabrication techniques using focused ion beams and emergent applications

被引：45

作者：

Vasile, MJ ^{[1
]}

Nassar, R ^{[1
]}

Xie, J ^{[1
]}

Guo, H ^{[1
]}

机构：

[1] Louisiana Tech Univ, Inst Micromfg, Ruston, LA 71272 USA

来源：

MICRON | 1999年 / 30卷 / 03期

基金：

美国国家科学基金会;

关键词：

focused ion beams; sputter simulations; sputter yields; microfabrication; micromanipulators; microtools; micromachining; microsurgical tools;

D O I：

10.1016/S0968-4328(99)00008-6

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

The application of focused ion beam (FIB) machining in several technologies aimed at microstructure fabrication is presented. These emergent applications include the production of micromilling tools for machining of metals and the production of microsurgical tools. An example of the use of microsurgical manipulators in a circulatory system measurement is presented. The steps needed to transform the laboratory fabrication of these tools and manipulators into a routine FIB production process are discussed. The ion milling of three-dimensional cavities by the exact solution of a mathematical model of the FIB deflection is demonstrated. A good agreement between the model calculation and the ion beam control has been obtained for parabolic and cosine cross-section features with planes of symmetry. (C) 1999 Elsevier Science Ltd. All rights reserved.

引用

页码：235 / 244

页数：10

共 32 条

[1]

ADAMS D, 1998, S AA MAT SCI MICR SY

[2] MECHANISMS OF LIQUID-METAL ION-SOURCE OPERATION [J].

BELL, AE ;

SWANSON, LW .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 10-1 (MAY) :783-787

[3] X-RAY MASK REPAIR [J].

BLAUNER, PG ;

MAUER, J .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1993, 37 (03) :421-434

[4] Development of the micromilling process for high-aspect-ratio microstructures [J].

Friedrich, CR ;

Vasile, MJ .

JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 1996, 5 (01) :33-38

[5] Micromilling development and applications for microfabrication [J].

Friedrich, CR ;

Coane, PJ ;

Vasile, MJ .

MICROELECTRONIC ENGINEERING, 1997, 35 (1-4) :367-372

[6] FOCUSED ION-BEAM TECHNOLOGY [J].

GAMO, K .

VACUUM, 1991, 42 (1-2) :89-93

[7]

GRAY A, 1998, COMMUNICATION

[8] FOCUSED ION-BEAM STIMULATED DEPOSITION OF ALUMINUM FROM TRIALKYLAMINE ALANES [J].

GROSS, ME ;

HARRIOTT, LR ;

OPILA, RL .

JOURNAL OF APPLIED PHYSICS, 1990, 68 (09) :4820-4824

[9]

Harriott L. R., 1987, Proceedings of the SPIE - The International Society for Optical Engineering, V773, P190, DOI 10.1117/12.940370

[10]

HARRIS N, 1996, AM J PHYSIOL, V270, P127

← 1 2 3 4 →