Preparation of Bragg gratings in sputter-deposited GeO2-SiO2 glasses by excimer-laser irradiation

被引：35

作者：

Nishii, J ^{[1
]}

Yamanaka, H ^{[1
]}

Hosono, H ^{[1
]}

Kawazoe, H ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,MAT & STRUCT LAB,MIDORI KU,YOKOHAMA,KANAGAWA 227,JAPAN

来源：

OPTICS LETTERS | 1996年 / 21卷 / 17期

关键词：

D O I：

10.1364/OL.21.001360

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

GeO2-SiO2 thin glass films were prepared by the rf sputtering deposition method. Changes in the refractive index of -3% and in the volume of +18% were induced in the film by irradiation with excimer-laser pulses. Bragg gratings a (periodic surface-relief pattern with a sinusoidal wave) have been written in the film by irradiation through a phase mask.

引用

页码：1360 / 1362

页数：3

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