Electrical properties of electron and ion beam irradiated YBa2Cu3O7-δ

被引:8
作者
Booij, WE
Elwell, CA
Tarte, EJ
McBrien, PF
Kahlmann, F
Moore, DF
Blamire, MG
Peng, NH
Jeynes, C
机构
[1] Univ Cambridge, Interdisciplinary Res Ctr Superconduct, Cambridge CB3 0HE, England
[2] Univ Surrey, Surrey Ctr Res Ion Beam Applicat, Sch Elect Engn Informat Technol & Math, Guildford GU2 5XH, Surrey, England
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1109/77.783632
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An electron beam with sufficient energy can be used to create a high quality Josephson junction in a single laver of YBa2Cu3O7-delta. The number of junctions thus produced is severely limited by the serial nature of the technique. An alternative method to create similar high quality Josephson junctions without such a serious throughput limitation is possibly the combination of high resolution masking and ion irradiation. Far this reason we have studied the electrical properties of both electron and proton irradiated YBa2Cu3O7-delta in some detail. It was found that the resistivity of electron beam irradiated barriers of intermediate length (200 nm) are strongly influenced by a proximity effect when the irradiated material has a finite T-c. At higher electron doses the superconducting properties are fully suppressed and the electrical behaviour is dominated by a Variable Range Hopping mechanism.
引用
收藏
页码:2886 / 2889
页数:4
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