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UV laser modifications and etching of thin polymer films in different environments.
被引：4
作者：
Bityurin, N
Muraviov, S
Alexandrov, A
Bronnikova, N
Malyshev, A
机构：
来源：
NONRESONANT LASER-MATTER INTERACTION (NLMI-9)
|
1997年
/
3093卷
关键词：
D O I：
10.1117/12.271664
中图分类号：
O43 [光学];
学科分类号：
070207 ;
0803 ;
摘要：
The role of environment in modification and etching of Polymethylmethacrylate (PMMA) films by the fifth harmonic of Nd laser is investigated experimentally. The theoretical model is developed, which describes the main features of modification and etching kinetics for sufficiently small laser fluences.
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页码：108 / 116
页数：9
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