Novel aberration monitor for optical lithography

被引:44
作者
Dirksen, P [1 ]
Juffermans, C [1 ]
Pellens, R [1 ]
Maenhoudt, M [1 ]
De Bisschop, P [1 ]
机构
[1] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands
来源
OPTICAL MICROLITHOGRAPHY XII, PTS 1 AND 2 | 1999年 / 3679卷
关键词
optical lithography; aberrations; image quality; phase shifting mask;
D O I
10.1117/12.354385
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The aberration monitor allows independent determination of spherical, coma, astigmatism and three point in a single experiment using existing equipment. The monitor consists of a circular phase object, with a diameter of similar to lambda/NA and a phase depth of lambda/2. Due to the relative large diameter, the image prints as a narrow ring into the resist. Without aberrations its contours are concentric circles. Aberrations deform the ring in a characteristic way. A detailed analysis of the ring shape through focus identifies the aberrations of the projection lens. A linear aberration model is compared with simulations. Experimental results of various aberrations are shown and are correlated to line width measurements and interferometric lens data.
引用
收藏
页码:77 / 86
页数:4
相关论文
共 9 条
[1]  
Born M., 1989, PRINCIPLES OPTICS
[2]  
BRUNNER T, 1996, INTERFACE
[3]  
DIRKSEN P, 1995, P SOC PHOTO-OPT INS, V2440, P701, DOI 10.1117/12.209297
[4]   Towards a comprehensive control of full-field image quality in optical photolithography [J].
Flagello, DG ;
deKlerk, J ;
Davies, G ;
Rogoff, R ;
Geh, B ;
Arnz, M ;
Wegmann, U ;
Kraemer, M .
OPTICAL MICROLITHOGRAPHY X, 1997, 3051 :672-685
[5]   Lithographic lens testing: Analysis of measured aerial images, interferometric data and photoresist measurements [J].
Flagello, DG ;
Geh, B .
OPTICAL MICROLITHOGRAPHY IX, 1996, 2726 :788-798
[6]   Pupil illumination; in situ measurement of partial coherence [J].
Kirk, JP ;
Progler, CJ .
OPTICAL MICROLITHOGRAPHY XI, 1998, 3334 :281-288
[7]   Potential causes of across field CD variation [J].
Progler, C ;
Du, H ;
Wells, G .
OPTICAL MICROLITHOGRAPHY X, 1997, 3051 :660-671
[8]   Impact of coma on CD control for multiphase PSM designs [J].
Schmidt, R ;
Spence, C ;
Capodieci, L ;
Krivokapic, Z ;
Geh, B ;
Flagello, D .
OPTICAL MICROLITHOGRAPHY XI, 1998, 3334 :15-24
[9]  
SUWA K, 1995, P SOC PHOTO-OPT INS, V2440, P712, DOI 10.1117/12.209298