共 9 条
[1]
Born M., 1989, PRINCIPLES OPTICS
[2]
BRUNNER T, 1996, INTERFACE
[3]
DIRKSEN P, 1995, P SOC PHOTO-OPT INS, V2440, P701, DOI 10.1117/12.209297
[4]
Towards a comprehensive control of full-field image quality in optical photolithography
[J].
OPTICAL MICROLITHOGRAPHY X,
1997, 3051
:672-685
[5]
Lithographic lens testing: Analysis of measured aerial images, interferometric data and photoresist measurements
[J].
OPTICAL MICROLITHOGRAPHY IX,
1996, 2726
:788-798
[6]
Pupil illumination; in situ measurement of partial coherence
[J].
OPTICAL MICROLITHOGRAPHY XI,
1998, 3334
:281-288
[7]
Potential causes of across field CD variation
[J].
OPTICAL MICROLITHOGRAPHY X,
1997, 3051
:660-671
[8]
Impact of coma on CD control for multiphase PSM designs
[J].
OPTICAL MICROLITHOGRAPHY XI,
1998, 3334
:15-24
[9]
SUWA K, 1995, P SOC PHOTO-OPT INS, V2440, P712, DOI 10.1117/12.209298