Wettability control of droplet deposition and detachment

被引:21
作者
Baret, JC
Brinkmann, M
机构
[1] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands
[2] IEMN, Interdisciplinary Res Inst, Biol Nanosyst Grp, F-59652 Villeneuve Dascq, France
关键词
D O I
10.1103/PhysRevLett.96.146106
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The conditions for droplet deposition on plane substrates are studied using electrowetting to continuously modulate the surface wettability. Droplets of controlled volume attached to the tip of a pipette are brought into contact with the surface. During retraction of the pipette the droplets are deposited or detach completely depending on volume and contact angle. The experimental limit of deposition in the contact angle or volume plane is in good agreement with analytical and numerical predictions obtained within the capillary model.
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页数:4
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