Effect of poling conditions on second-harmonic generation in fused silica

被引：75

作者：

Takebe, H ^{[1
]}

Kazansky, PG ^{[1
]}

Russell, PSJ ^{[1
]}

Morinaga, K ^{[1
]}

机构：

[1] KYUSHU UNIV,GRAD SCH ENGN SCI,DEPT MAT SCI & TECHNOL,FUKUOKA 816,JAPAN

来源：

OPTICS LETTERS | 1996年 / 21卷 / 07期

关键词：

D O I：

10.1364/OL.21.000468

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A systematic study of the effects of poling time and applied voltage on second-harmonic (SH) generation in thermally poled silica glass reveals that the SH signal is proportional to the square of the applied voltage and that the speed of the poling process increases with the applied voltage. Prior treatment of the samples is found to affect the poling process, and the optimum poling conditions are observed to depend on the poling atmosphere. The mechanism of thermal poling is discussed in the light of these new results. (C) 1996 Optical Society of America

引用

页码：468 / 470

页数：3

共 13 条

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