Reversible wettability control of TiO2 surface by light irradiation

被引:191
作者
Miyauchi, M
Kieda, N
Hishita, S
Mitsuhashi, T
Nakajima, A
Watanabe, T
Hashimoto, K
机构
[1] Univ Tokyo, Adv Sci & Technol Res Ctr, Meguro Ku, Tokyo 1538904, Japan
[2] Shonan Inst Technol, Fac Engn, Fujisawa, Kanagawa 2518511, Japan
[3] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan
[4] Adv Syst Technol Incubat, Chigasaki, Kanagawa 2538577, Japan
关键词
chemical vapor deposition; photochemistry; surface structure; morphology; roughness; and topography; titanium oxide; wetting; semiconducting surfaces;
D O I
10.1016/S0039-6028(02)01551-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Titanium dioxide (TiO2) thin films with various surface morphologies were prepared on the substrates of (100) plane of strontium titanate by a metalorganic chemical vapor deposition process. These TiO2 thin films became highly hydrophilic by ultraviolet (UV) irradiation, and returned to the initial relatively hydrophobic state by visible-light (VIS) irradiation. The hydrophobic-hydrophilic conversion induced by UV irradiation, is due to the increase in dissociated water adsorption on the film surface. In contrast, the conversion from hydrophilic to hydrophobic by VIS irradiation is caused by the elimination of water adsorbed on the surface due to the heat generated. Changes of water contact angle between hydrophilic states and hydrophobic ones strongly depended on the roughness of the film surface. The wettability of the TiO2 surface was enabled to convert between hydrophilic and hydrophobic reversibly by alternative UV and VIS irradiation. (C) 2002 Published by Elsevier Science B.V.
引用
收藏
页码:401 / 407
页数:7
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