Reactivity of MgB2 with common substrate and electronic materials

被引:31
作者
He, T [1 ]
Cava, RJ
Rowell, JM
机构
[1] Princeton Univ, Dept Chem, Princeton, NJ 08544 USA
[2] Princeton Univ, Princeton Mat Inst, Princeton, NJ 08544 USA
[3] Northwestern Univ, Inst Mat Res, Evanston, IL 60208 USA
关键词
D O I
10.1063/1.1433915
中图分类号
O59 [应用物理学];
学科分类号
摘要
The reactivity of MgB2 with powdered forms of common substrate and electronic materials is reported. Reaction temperatures between 600 and 800 degreesC, encompassing the range commonly employed in thin-film fabrication, were studied. The materials tested for reactivity were ZrO2, yttria stabilized zirconia, MgO, Al2O3, SiO2, SrTiO3, TiN, TaN, AlN, Si, and SiC. At 600 degreesC, MgB2 reacted only with SiO2 and Si. At 800 degreesC, however, reactions were observed for MgB2 with Al2O3, SiO2, Si, SiC, and SrTiO3. The T-c of MgB2 decreased in the reactions with SiC and Al2O3. (C) 2002 American Institute of Physics.
引用
收藏
页码:291 / 293
页数:3
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