The reactive magnetron deposition of CrNxOy films:: first results of property investigations

Pure nitride films (TiN, CrN) are good wear resistant materials. For applications at high temperatures they have the disadvantage of a low corrosion stability. To avoid this we have tried to change the chemical composition by a reactive magnetron sputtering process with an oxygen-nitrogen working gas. X-ray diffraction (XRD) investigations show a well-oriented (100) structure for pure CrN films. An increasing oxygen flow results in a Cr2O3-based structure with at first a (001) texture and then a (110) texture. Pure oxide films are composed of the Cr2O3-phase with a (110) texture. Grain size and microstrain influence the mechanical properties. The microhardness of the CrNxOy films reaches the values of pure CrN films. The nitrogen content was, in every case, lower than atomic 5% except at a 2.5 seem oxygen flow and a 15 seem nitrogen flow (12 at.%). The flow of 2.5 seem oxygen relates to an amorphous structure. (C) 1999 Elsevier Science S.A. All rights reserved.