Stoichiometry and infrared absorption of amorphous a-C1-xNx:H carbon nitride films

被引:23
作者
Bouchet-Fabre, B
Godet, C
Lacerda, M
Charvet, S
Zellama, K [1 ]
Ballutaud, D
机构
[1] Univ Picardie, LPMC, F-80039 Amiens, France
[2] Univ Paris Sud, LURE, F-91898 Orsay, France
[3] Ecole Polytech, CNRS, UMR 7647, LPICM, F-91128 Palaiseau, France
[4] CNRS, UMR 8635, LPSC, F-92100 Boulogne, France
关键词
D O I
10.1063/1.1650879
中图分类号
O59 [应用物理学];
学科分类号
摘要
Stoichiometry, bonding configurations and structural properties of plasma-deposited hydrogen-rich amorphous carbon nitride a-C1-xNx:H (0<x<0.20) films have been investigated using infrared and Raman vibrational spectroscopies, along with x-ray photoemission spectroscopy at the C and N K-edges. With increasing N incorporation in a-C1-xNx:H, the total H content decreases slightly and C-H vibrations are progressively replaced by N-H vibrations. The dominant bonding configuration is C=N throughout the composition range, although C=N and C-N saturate above 10 N at. %, and C=N configurations steadily increase throughout the stoichiometry range. A strong conjugation of imine (C=N) and nitrile (C=N) groups with aromatic rings is evidenced while the Raman signature of the sp(2) C phase indicates an increase in the D to G peak intensity ratio, related to some ordering of the sp(2) clustered phase. (C) 2004 American Institute of Physics.
引用
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页码:3427 / 3436
页数:10
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