Catalyst-free growth of GaN nanowires

被引:88
作者
Bertness, KA [1 ]
Sanford, NA
Barker, JM
Schlager, JB
Roshko, A
Davydov, AV
Levin, I
机构
[1] Natl Inst Stand & Technol, Boulder, CO 80305 USA
[2] Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA
关键词
gallium nitride; molecular beam epitaxy (MBE); nanostructures; nanotechnology;
D O I
10.1007/s11664-006-0102-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have grown GaN and AlGaN nanowires on Si (111) substrates with gas-source molecular beam epitaxy (MBE). No metal catalysts were used. The nanowires displayed a number of interesting materials properties, including room-temperature luminescence intensity greater than that of free-standing HYPE-grown GaN, relaxed lattice parameters, and the tendency of nanowires dispersed in solvents to align in response to electric fields. The wires were well separated, 50-250 nm in diameter, and grew to lengths ranging from 2 mu m to 7 mu m. Transmission electron microscopy indicated that the wires were free of defects, unlike the surrounding matrix layer.
引用
收藏
页码:576 / 580
页数:5
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