Deposition of indium tin oxide films on polycarbonate substrates by radio-frequency magnetron sputtering

被引:87
作者
Wu, WF [1 ]
Chiou, BS [1 ]
机构
[1] NATL CHIAO TUNG UNIV,INST ELECT,HSINCHU 30039,TAIWAN
关键词
coatings; indium oxide; optical properties; sputtering;
D O I
10.1016/S0040-6090(96)09311-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Indium tin oxide (ITO) films have been deposited onto polycarbonate (PC) substrates by radio frequency (rf) magnetron sputtering. The influence of the oxygen content during sputtering on the film morphology, and the electrical and optical properties of the films have been investigated. Both the refractive index and the extinction coefficient decrease with increasing oxygen content. In this study, the figures of merit T-10/R-sh of the films are higher than those for low-temperature sputtered films reported in the literature. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:221 / 227
页数:7
相关论文
共 19 条
[1]   RF MAGNETRON-SPUTTERED INDIUM TIN OXIDE FILM ON A REACTIVELY ION-ETCHED ACRYLIC SUBSTRATE [J].
CHIOU, BS ;
HSIEH, ST .
THIN SOLID FILMS, 1993, 229 (02) :146-155
[2]   DEPOSITION OF INDIUM TIN OXIDE-FILMS ON ACRYLIC SUBSTRATES BY RADIOFREQUENCY MAGNETRON SPUTTERING [J].
CHIOU, BS ;
HSIEH, ST ;
WU, WF .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1994, 77 (07) :1740-1744
[3]   PROPERTIES OF TRANSPARENT CONDUCTING OXIDES DEPOSITED AT ROOM-TEMPERATURE [J].
DAVIS, L .
THIN SOLID FILMS, 1993, 236 (1-2) :1-5
[4]   TRANSPARENT, CONDUCTING INDIUM TIN OXIDE-FILMS FORMED ON LOW OR MEDIUM TEMPERATURE SUBSTRATES BY ION-ASSISTED DEPOSITION [J].
DOBROWOLSKI, JA ;
HO, FC ;
MENAGH, D ;
SIMPSON, R ;
WALDORF, A .
APPLIED OPTICS, 1987, 26 (24) :5204-5210
[5]   TRANSPARENT HEAT-REFLECTING COATINGS BASED ON HIGHLY DOPED SEMICONDUCTORS [J].
FRANK, G ;
KAUER, E ;
KOSTLIN, H .
THIN SOLID FILMS, 1981, 77 (1-3) :107-117
[6]  
GRZEGORCZYK D, 1974, HDB PLASTICS ELECT
[7]   MICROSTRUCTURE AND ELECTRICAL CHARACTERISTICS OF SPUTTERED INDIUM TIN OXIDE-FILMS [J].
HIGUCHI, M ;
SAWADA, M ;
KURONUMA, Y .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (06) :1773-1775
[8]   DEPTH PROFILING OF OXYGEN CONCENTRATION OF INDIUM TIN OXIDE-FILMS FABRICATED BY REACTIVE SPUTTERING [J].
HONDA, S ;
TSUJIMOTO, A ;
WATAMORI, M ;
OURA, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1994, 33 (9A) :L1257-L1260
[9]   THE ORIGIN OF THE INHOMOGENEITY OF ELECTRICAL-RESISTIVITY IN MAGNETRON-SPUTTERED INDIUM TIN OXIDE THIN-FILMS [J].
ICHIHARA, K ;
INOUE, N ;
OKUBO, M ;
YASUDA, N .
THIN SOLID FILMS, 1994, 245 (1-2) :152-156
[10]   ELECTRICAL AND OPTICAL-PROPERTIES OF INDIUM TIN OXIDE THIN-FILMS DEPOSITED ON UNHEATED SUBSTRATES BY DC REACTIVE SPUTTERING [J].
KARASAWA, T ;
MIYATA, Y .
THIN SOLID FILMS, 1993, 223 (01) :135-139