Structure and optical properties of carbon nitride films deposited by magnetron sputtering

被引：41

作者：

Lejeune, M ^{[1
]}

Durand-Drouhin, O ^{[1
]}

Zellama, K ^{[1
]}

Benlahsen, M ^{[1
]}

机构：

[1] Univ Picardie, Fac Sci Amiens, Phys Mat Condensee Lab, F-80039 Amiens 2, France

来源：

SOLID STATE COMMUNICATIONS | 2001年 / 120卷 / 9-10期

关键词：

disordered systems; surface and interfaces; thin films; optical properties;

D O I：

10.1016/S0038-1098(01)00411-2

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Carbon nitride (CN,) thin films were deposited using RF magnetron sputtering technique of a graphite target in a pure N-2 atmosphere at different RF power. Film composition was analysed using X-ray photoelectron spectroscopy measurements correlated with infrared absorption, Raman spectroscopy, optical transmission and photothermal deflection spectroscopy experiments. The observed variation of the optical properties are attributed to the changes in the atomic bonding structures, which were induced by ion bombardment, increasing both the sp(2) carbon content and their relative disorder. (C) 2001 Elsevier Science Ltd. All rights reserved.

引用

页码：337 / 342

页数：6

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