Bonding defects and optical band gaps of DLC films deposited by microwave surface-wave plasma CVD

被引:37
作者
Adhikary, S
Tian, XM
Adhikari, S
Omer, AMM
Uchida, H
Umeno, M
机构
[1] Chubu Univ, Dept Ingn Elect & Informat, Kasugai, Aichi 4878501, Japan
[2] Chubu Univ, Dept Elect & Elect Engn, Kasugai, Aichi 4878501, Japan
关键词
DLC films; microwave surface-wave plasma CVD; defect density; optical band gap;
D O I
10.1016/j.diamond.2005.08.030
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effects of CH4/C2H4 flow ratio and annealing temperature on the defect states and optical properties of diamond-like carbon (DLC) films deposited by novel microwave surface-wave plasma chemical vapour deposition (MW SWP CVD) are studied through UV/VIS/NIR measurements, atomic force microscopy, Raman spectroscopy and electron spin resonance analysis. The optical band gap of DLC has been tailored between a relatively narrow range, 2.65-2.5 eV by manipulating CH4/C2H4 flow ratio and a wide range, 2.5-0.95 by thermal annealing. The ESR spin density varied between 10(19) to 10(17) spins/cm(3) depending on the CH4/C2H4 flow ratio (1:3 to 3:1). The defect density increased with increasing annealing temperature. Also, there is a strong dependence of spin density on the optical band gap of the annealed-DLC films, and this dependency has been qualitatively understood from Raman spectra of the films as a result of structural changes due to sp(3)/sp(2) carbon bonding network. The surfaces of the films are found to be very smooth and uniform (RMS roughness <0.5 nm). (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:1832 / 1834
页数:3
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