One-step patterning of aligned nanowire arrays by programmed dip coating

被引：139

作者：

Huang, Jiaxing

Fan, Rong

Connor, Stephen

Yang, Peidong ^{[1
]}

机构：

[1] Univ Calif Berkeley, Dept Chem, Berkeley, CA 94720 USA

[2] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USA

来源：

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION | 2007年 / 46卷 / 14期

关键词：

capillary flow; dewetting; interfaces; nanotechnology; patterning;

D O I：

10.1002/anie.200604789

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Dip, stick, slip: Dip coating, a widely used industrial process for making thin films, is used to align and position nanowires by means of the stick-slip motion of the solvent meniscus. Nanowire arrays with predefined spacing can be readily "printed" on a large substrate with tunable wire density (see picture), thus providing a facile method for producing nanowire-based devices. (Figure Presented). © 2007 Wiley-VCH Verlag GmbH & Co. KGaA.

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页码：2414 / 2417

页数：4

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