Photocatalytic degradation rate of oxalic acid on a semiconductive layer of n-TiO2 particles in a batch mode plate photoreactor -: Part II:: Light intensity limit

被引:21
作者
Krysa, J
Vodehnal, L
Jirkovsky, J
机构
[1] Inst Chem Technol, Dept Inorgan Technol, CR-16628 Prague 6, Czech Republic
[2] Acad Sci Czech Republ, J Heyrovsky Inst Phys Chem, CR-18223 Prague, Czech Republic
关键词
photocatalytic degradation; oxalic acid; n-TiO2; light intensity;
D O I
10.1023/A:1003464207063
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The effect of light intensity, flow rate and oxygen bubbling on the photocatalytic degradation rate of oxalic acid on a layer of TiO2 particles was investigated. At higher concentrations of oxalic acid (greater than or equal to 0.005 M) and photon flux intensity in the range 3.26 x 10(-10) to 1.07 x 10(-8) einstein cm(-2) s(-1), the rate of photocatalysis was controlled simultaneously by the flux of both oxygen and photons. This is probably caused by the ability of oxygen to react with photogenerated electrons and thus suppress the electron-hole recombination and increase the efficiency of the photocatalytic degradation.
引用
收藏
页码:429 / 435
页数:7
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