Fabrication of patterned amine reactivity templates using 4-chloromethylphenylsiloxane self-assembled monolayer films

Amine surface reactivity templates were fabricated from (4-(chloromethyl)-phenyl) trichlorosilane (CMP) organosiloxane self-assembled monolayers (SAMs) via a sample, two-step process involving initial photopatterning and subsequent selective chemical reaction in the irradiated areas of the film. CMP SAM was successfully patterned at low exposure dose, and phototransformed to chemically reactive aldehyde and carboxylic acid surface residues.