TiO2-based superhydrophobic-superhydrophilic patterns: Fabrication via an ink-jet technique and application in offset printing

被引：110

作者：

Nishimoto, Shunsuke ^{[1
]}

Kubo, Atsushi ^{[2
]}

Nohara, Kenji ^{[3
]}

Zhang, Xintong ^{[1
]}

Taneichi, Noriaki ^{[2
]}

Okui, Toshiki ^{[2
]}

Liu, Zhaoyue ^{[1
]}

Nakata, Kazuya ^{[1
]}

Sakai, Hideki ^{[3
]}

Murakami, Taketoshi ^{[1
]}

Abe, Masahiko ^{[3
]}

Komine, Takashi ^{[2
]}

Fujishima, Akira ^{[1
]}

机构：

[1] Kanagawa Acad Sci & Technol, Takatsu Ku, Kawasaki, Kanagawa 2130012, Japan

[2] Tokyo Ohka Kogyo Co Ltd, Kanagawa 2530114, Japan

[3] Tokyo Univ Sci, Fac Sci & Technol, Noda, Chiba 2788510, Japan

来源：

APPLIED SURFACE SCIENCE | 2009年 / 255卷 / 12期

关键词：

TiO2; photocatalyst; Superhydrophobic-superhydrophilic; Self-assembled monolayers; Ink-jet technique; Offset printing; SELF-ASSEMBLED MONOLAYERS; TIO2; TRANSPARENT; BEHAVIOR; SURFACE; ACIDS; FILM;

D O I：

10.1016/j.apsusc.2009.01.084

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A superhydrophobic-superhydrophilic pattern was prepared on an anodized Al plate by a new fabrication process. The process consists of five key steps: (1) TiO2 coating of the plate, (2) surface modi. cation with self-assembled monolayers (SAMs), (3) formation of aqueous UV light-resistant ink patterns by an ink-jet technique, (4) photocatalytic decomposition of SAMs and surface conversion to the superhydrophilic state and (5) removal of the aqueous ink patterns by water washing. It is particularly noteworthy that the wettability pattern can be quickly formed on the plate, without the use of a photomask. The fabricated superhydrophobic-superhydrophilic pattern is shown to be applicable to offset printing. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：6221 / 6225

页数：5

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