Titanium carbide film deposition by DC magnetron reactive sputtering using a solid carbon source

被引：31

作者：

Kusano, E ^{[1
]}

Satoh, A ^{[1
]}

Kitagawa, M ^{[1
]}

Nanto, H ^{[1
]}

Kinbara, A ^{[1
]}

机构：

[1] Kanazawa Inst Technol, AMS R&D Ctr, Matto, Ishikawa, Japan

来源：

THIN SOLID FILMS | 1999年 / 343卷

关键词：

titanium carbide; sputtering; hardness;

D O I：

10.1016/S0040-6090(98)01638-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Titanium carbide films with various C/Ti ratios have been deposited by DC magnetron sputtering using carbon sheets on the Ti target erosion area as a solid carbon source. By changing the number of carbon sheets (5 x 5 x 1 mm(3)) from 0 to 24 pieces, the C/Ti compositional ratio of the films was changed. The composition, structure, and hardness of the deposited films were estimated as a function of the ratio of the source carbon area to the titanium target erosion area. The results of X-ray photoelectron spectroscopy showed that the C contents in the films increased to Ti : C = 60 : 40 as the source C/Ti areal ratio increased. By X-ray diffraction, the films obtained for C/Ti areal ratios above 0.1 were found to possess the face-centered cubic structure and that the d-value of TiC (111) increased monotonically from 0.238 to 0.249 nm as the C/Ti areal ratio increased. The hardness of the films also increased monotonically as the C/Ti areal ratio increased, yielding a maximum of 11 GPa. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：254 / 256

页数：3

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