Photo-fabrication of surface relief gratings on polymer films

被引:12
作者
Kim, DY
Lee, TS
Tripathy, SK
Jiang, XL
Li, L
Kumar, J
机构
[1] UNIV MASSACHUSETTS,DEPT CHEM,CTR ADV MAT,LOWELL,MA 01854
[2] UNIV MASSACHUSETTS,DEPT PHYS,CTR ADV MAT,LOWELL,MA 01854
关键词
D O I
10.1002/masy.19971160112
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Surface relief gratings were optically produced on a number of azobenzene-based polymer films. The surface grating formation was investigated by monitoring the diffraction efficiency and using atomic force microscopy. The effect of the structure of the chromophores on surface modulation was investigated. The surface deformation process depended on the polarization state of the writing beams. The localized variations of the light intensity and alteration of the resulting electric field polarization were essential writing conditions to the formation of the surface relief gratings. The surface pattern from straight edge diffraction established that the surface profile of the recorded gratings is proportional to negative gradient of the intensity pattern incident on the polymer film.
引用
收藏
页码:127 / 134
页数:8
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